掺镍WS2@WO3异质结用于废水处理,增强可见光光催化性能,富集吸附

F. Mousavi, A. Khodadadi, Y. Mortazavi, S. Didarataee
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引用次数: 0

摘要

合成了对不同WS2:WO3比和Ni含量具有增强吸附性能的掺镍WS2@WO3异质结双功能光催化剂,并将其用于去除亚甲基蓝。采用水热法首次合成了(ni掺杂)氧化钨,并通过不同温度和时间的硫化/部分氧化来调整WS2: WO3比。采用XRD、BET表面积测量、FESEM、PL、FTIR、程序升温氧化(TPO)和zeta电位测量等方法对样品进行了表征。TPO帮助找到了部分氧化过程的360°C的温和氧化温度,并估计了样品中的硫化物百分比。在400℃的硫化温度下,WS2:WO3的最佳配比为1:1 .72。8 mol% ni掺杂WS2@WO3通过综合光降解和吸附,对MB的去除率达到99%。
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Ni-doped WS2@WO3 heterojunction for waste-water treatment with enhanced visible-light photocatalytic performance enriched with adsorption
Ni-doped WS2@WO3 heterojunction bifunctional photocatalysts with enhanced adsorption of various WS2:WO3 ratios and Ni contents were synthesized and used for methylene blue removal. (Ni-doped) tungsten oxide was first synthesized by a hydrothermal method and the WS2: WO3 ratio was tuned by its sulfurization/partial oxidation at different temperatures and periods of times. The nanostructured samples were characterized by XRD, BET surface area measurement, FESEM, PL, FTIR spectroscopy, temperature programmed oxidation (TPO), and zeta potential measurement methods. TPO helped finding a mild oxidation temperature of 360°C for the partial oxidation process and also an estimation of sulfide percentage in samples. The optimum ratio of WS2:WO3 of 1: 1.72 was attained at 400°C sulfurization temperature. 8 mol%Ni-doped WS2@WO3 exhibited 99% of MB removal by an integrated photodegradation and adsorption.
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