通过采用具有单轴和[100]单平面通道的直凹槽通道阵列晶体管克服DRAM的缩放限制

I. Kim, S. Park, J. Yoon, D. Kim, J.Y. Noh, J. Lee, Y. Kim, M. Hwang, K. Yang, Joosung Park, Kyungseok Oh
{"title":"通过采用具有单轴和[100]单平面通道的直凹槽通道阵列晶体管克服DRAM的缩放限制","authors":"I. Kim, S. Park, J. Yoon, D. Kim, J.Y. Noh, J. Lee, Y. Kim, M. Hwang, K. Yang, Joosung Park, Kyungseok Oh","doi":"10.1109/IEDM.2005.1609339","DOIUrl":null,"url":null,"abstract":"Recessed channel array transistors (RCAT) for DRAM are implemented with <100> uni-axial and {100} uni-plane channels for the first time. It is found that this structure improves the cell transistor drivability by 25% with the improvement being more effective in straight shape active RCAT than the diagonal shape active RCAT due to the larger dimension of the horizontal <100> axial channel in the {100} plane. Enhanced RCAT drivability improves tRDL (allowed time interval between data-in and word-line precharge) and retention time, which allows for lowering the gate voltage over-drive (VPP) in DRAM operation. This possibility provides a breakthrough in reliability limitations and leads to better performance in nano-scaled DRAM","PeriodicalId":13071,"journal":{"name":"IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest.","volume":"3 1","pages":"319-322"},"PeriodicalIF":0.0000,"publicationDate":"2005-12-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Overcoming DRAM scaling limitations by employing straight recessed channel array transistors with <100> uni-axial and [100] uni-plane channels\",\"authors\":\"I. Kim, S. Park, J. Yoon, D. Kim, J.Y. Noh, J. Lee, Y. Kim, M. Hwang, K. Yang, Joosung Park, Kyungseok Oh\",\"doi\":\"10.1109/IEDM.2005.1609339\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Recessed channel array transistors (RCAT) for DRAM are implemented with <100> uni-axial and {100} uni-plane channels for the first time. It is found that this structure improves the cell transistor drivability by 25% with the improvement being more effective in straight shape active RCAT than the diagonal shape active RCAT due to the larger dimension of the horizontal <100> axial channel in the {100} plane. Enhanced RCAT drivability improves tRDL (allowed time interval between data-in and word-line precharge) and retention time, which allows for lowering the gate voltage over-drive (VPP) in DRAM operation. This possibility provides a breakthrough in reliability limitations and leads to better performance in nano-scaled DRAM\",\"PeriodicalId\":13071,\"journal\":{\"name\":\"IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest.\",\"volume\":\"3 1\",\"pages\":\"319-322\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-12-05\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.2005.1609339\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2005.1609339","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

摘要

用于DRAM的凹槽通道阵列晶体管(RCAT)首次实现了单轴和{100}单平面通道。研究发现,这种结构将电池晶体管的驱动性提高了25%,并且由于{100}平面上的水平轴向通道尺寸更大,直线型有源RCAT比对角线型有源RCAT的改进更有效。增强的RCAT可驾驶性提高了tRDL(数据输入和字行预充电之间的允许时间间隔)和保持时间,从而降低了DRAM操作中的栅极电压过度驱动(VPP)。这种可能性为可靠性限制提供了突破,并导致纳米级DRAM的更好性能
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Overcoming DRAM scaling limitations by employing straight recessed channel array transistors with <100> uni-axial and [100] uni-plane channels
Recessed channel array transistors (RCAT) for DRAM are implemented with <100> uni-axial and {100} uni-plane channels for the first time. It is found that this structure improves the cell transistor drivability by 25% with the improvement being more effective in straight shape active RCAT than the diagonal shape active RCAT due to the larger dimension of the horizontal <100> axial channel in the {100} plane. Enhanced RCAT drivability improves tRDL (allowed time interval between data-in and word-line precharge) and retention time, which allows for lowering the gate voltage over-drive (VPP) in DRAM operation. This possibility provides a breakthrough in reliability limitations and leads to better performance in nano-scaled DRAM
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