栅极全锗nMOSFET的三维蒙特卡罗模拟

Shufang Zhu, K. Wei, G. Du, Xiaoyan Liu
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引用次数: 1

摘要

栅极-全方位mosfet是一种很有前途的新型器件结构,锗具有很高的载流子迁移率。本文采用有效电位法对GAA锗纳米线nMOSFET进行了三维并行蒙特卡罗仿真。将模拟结果与经典结果进行比较,可以看出量子效应对密度、速度和能量的分布都有影响,并使漏极电流减小。
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3D Monte Carlo simulation of Gate-All-Around Germanium nMOSFET
Gate-All-Around mosfets have been investigated as promising new device structures, and Germanium is used for its high carrier mobility. In this paper, a 3D parallel Monte Carlo simulation of GAA Ge Nanowire nMOSFET with Effective Potential Method is implemented. Compared the simulation results with classical results, we can see that the quantum effects have an affect on the distribution of density, velocity and energy, and they make a decrease on the drain current as well.
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