纳米硅等离子体结构纳秒激光退火的数值模拟

2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) Pub Date : 2019-09-01 DOI:10.1109/SISPAD.2019.8870529

A. Royet, S. Kerdilès, P. Acosta Alba, C. Bonafos, V. Paillard, F. Cristiano, B. Curvers, K. Huet

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引用次数: 0

摘要

本文报道了基于硅纳米粒子嵌入SiO2基体的等离子体结构的纳秒激光热退火的数值模拟。从这些模拟中，我们提取了要采用的结构设计准则。本研究还探讨了预期的激光退火工艺窗口和纳米颗粒覆盖的影响。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Numerical simulations of nanosecond laser annealing of Si nanoparticles for plasmonic structures

This paper reports numerical simulations of nanosecond laser thermal annealing of plasmonic structures based on Si-nanoparticles embedded in a SiO2 matrix. From these simulations, we extracted guidelines for the structure design to be adopted. This study also investigates the expected laser annealing process window and the influence of nanoparticles coverage.

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2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)

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