4kb非易失性纳米隙存储器(NGpM),具有1ns编程能力

T. Takahashi, S. Furuta, Y. Masuda, S. Kumaragurubaran, T. Sumiya, M. Ono, Y. Hayashi, T. Shimizu, H. Suga, M. Horikawa, Y. Naitoh
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引用次数: 2

摘要

采用新开发的垂直纳米隙结构制备了4k位非易失性高速纳米隙存储器件,并对其存储特性进行了评价。新开发的垂直纳米隙结构实现了电极间隙的可控,与初始相横向纳米隙结构相比,其产率更高。这些结构被集成在CMOS芯片上。特殊的嵌入式测量电路显示,从低电阻状态到高电阻状态(从开到关)的编程速度为1ns。
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4kb nonvolatile nanogap memory (NGpM) with 1 ns programming capability
A 4k bits nonvolatile high-speed nanogap memory device was fabricated with a newly developed vertical nanogap structure and its memory characteristics were evaluated. The newly developed vertical nanogap structures realized controllable electrode gap and higher yield compared to the initial phase lateral type nanogap structure. The structures were integrated on a CMOS chip. The specially embedded measurement circuit revealed programming speed from a low resistance state to a high resistance state (from on to off state) to be 1 ns.
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