基于EP和NEGF方法的全带量子输运建模纳米线晶体管的应用

M. Pala, D. Esseni
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引用次数: 3

摘要

许多现代电子器件的有源区域由真正纳米尺度结构的半导体组成,要么是超薄体fet (utrfet),要么是3D结构,如fin - fet、多栅极fet (mugfet)和纳米线fet (NW)[1]。因此,量子力学效应不仅在子带分裂[2]方面变得突出,而且在CMOS fef中的源漏隧穿[3],[4],[5]和隧道场效应管(tfet)中的带对带隧穿(BTBT)[6],[7]方面也变得突出。基于CMOS的量子点被提出作为量子计算平台,也证明了纳米级场效应管中量子效应的相关性[8]。
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Full band quantum transport modelling with EP and NEGF methods; application to nanowire transistors
The active region of many modern electron devices consists of semiconductors structured at truly nanometric dimensions, either as ultra-thin-body FETs (UTRFETs), or as 3D architectures such as Fin-FETs, multi-gate FETs (MuGFETs), and nanowire (NW) FETs [1]. Quantum mechanical effects have thus become prominent not only in terms of subband splitting [2], but also in terms of source-drain tunnnelling in CMOS FEFs [3], [4], [5], and band-to-band-tunnnelling (BTBT) in Tunnel FETs (TFETs) [6], [7]. The relevance of quantum effects in nanoscale FETs is also witnessed by the fact hat CMOS based quantum dots have been proposed as a platform for quantum computing [8].
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