三角碲纳米结构的形成、能量和带隙

Aaron Kramer, M. L. Van de Put, C. Hinkle, W. Vandenberghe
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摘要

三角碲(t-Te)是一种范德华材料,最近引起了纳米电子学界的兴趣,因为在纳米结构中已经观察到高空穴迁移率、高带隙和低温生长。我们使用第一性原理模拟分析了各种t-Te纳米结构(纳米线和纳米层)。我们比较了不同形状和尺寸的碲纳米结构的带隙变化和相对稳定性。我们确定纳米线具有更高的带隙,并且优先生长,而不是t-Te层。我们还提出了一个简化模型,使用范德华相互作用的数量来解释t-Te纳米结构之间的相对稳定性。最后,我们研究了独特形状的(辅助)t-Te纳米结构,并验证了它们的稳定性遵循相同的简化模型。
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Trigonal Tellurium Nanostructure Formation Energy and Band gap
Trigonal-Tellurium (t-Te), a van der Waals material, recently garnered interest to the nanoelectronics community because a high hole mobility, a high bandgap, and low temperature growth have all been observed in nanostructures. We analyze various t-Te nanostructures (nanowires and layers) using first principles simulations. We compare bandgap variation and relative stability among different shapes and sizes of Te nanostructures. We determine that nanowires host higher bandgaps and are preferentially grown, rather than layers of t-Te. We also propose a simplified model using the number of van der Waals interactions in explaining relative stability among t-Te nanostructures. Finally, we study uniquely shaped (auxiliary) t-Te nanostructures and verify that their stability obeys the same simplified model.
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