使用双稳光控半导体开关(BOSS)的频率敏捷射频源配置演示

D. Stoudt, M. A. Richardson, S. Moran
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引用次数: 8

摘要

在铜补偿、硅掺杂、半绝缘的砷化镓中,持续的光电导率和光猝灭的过程已经在兆瓦级的功率水平上得到了证明。这些过程允许开发一个开关,该开关可以通过应用一个激光脉冲(/spl lambda/=1.06 /spl mu/m)关闭,并通过应用波长等于第一个激光的两倍的第二个激光脉冲(/spl lambda/=2.13 /spl mu/m)打开。打开阶段需要材料中重组中心(RC)的足够浓度才能在亚纳秒状态下打开。这些rc是在块状GaAs材料中通过快中子辐照(/spl sim/1-MeV)产生的。中子辐照的双稳态光控半导体开关(BOSS)器件在不到一纳秒的时间内,在大约36千伏/厘米(18千伏)的平均电场下被打开,同时以大约1 GHz的双脉冲爆发的重复频率工作。演示了通过改变时间间隔来修改电脉冲频率内容的能力。还讨论了在频率敏捷射频源配置中演示BOSS器件工作的结果。
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Demonstration of a frequency-agile RF source configuration using bistable optically controlled semiconductor switches (BOSS)
The processes of persistent photoconductivity followed by photo-quenching have been demonstrated at megawatt power levels in copper-compensated, silicon-doped, semi-insulating gallium arsenide. These processes allow a switch to be developed that can be closed by the application of one laser pulse (/spl lambda/=1.06 /spl mu/m) and opened by the application of a second laser pulse with a wavelength equal to twice that of the first laser (/spl lambda/=2.13 /spl mu/m). The opening phase requires a sufficient concentration of recombination centers (RC) in the material for opening to occur in the subnanosecond regime. These RCs are generated in the bulk GaAs material by fast-neutron irradiation (/spl sim/1-MeV). Neutron-irradiated bistable optically controlled semiconductor switch (BOSS) devices have been opened against a rising average electric field of about 36 kV/cm (18 kV) in a time less than one nanosecond while operating at a repetition rate, within a two-pulse burst, of about 1 GHz. The ability to modify the frequency content of the electrical pulses, by varying the time separation, is demonstrated. Results demonstrating the operation of BOSS devices in a frequency-agile RF source configuration are also discussed.
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