Kihwan Kim, Evan Kimberly, Andrew Damiani, G. Hanket, W. Shafarman
{"title":"+金属前驱体H2Se/Ar/H2S三步反应,大面积Cu(In,Ga)(Se,S)2,Ga分布均匀","authors":"Kihwan Kim, Evan Kimberly, Andrew Damiani, G. Hanket, W. Shafarman","doi":"10.1109/pvsc-vol2.2012.6656716","DOIUrl":null,"url":null,"abstract":"A three-step H<inf>2</inf>Se/Ar/H<inf>2</inf>S reaction is used to process Cu-In-Ga metal precursors to form Cu(In,Ga)(Se,S)<inf>2</inf> films over 10 × 10 cm<sup>2</sup> substrates. The 1<sup>st</sup> selenization step gives fine microstructure with Ga accumulation near the Mo back contact, primarily in a Cu<inf>9</inf>Ga<inf>4</inf> phase. Significant grain growth with homogenous through-film Ga distribution is obtained by the 2<sup>nd</sup> Ar annealing step. The 3<sup>rd</sup> sulfization step completes the reaction process and incorporates S near the Cu(In,Ga)Se<inf>2</inf> surface. The resulting films show good adhesion and yielded devices with η = 14.8% and V<inf>OC</inf> = 612 mV.","PeriodicalId":6420,"journal":{"name":"2012 IEEE 38th Photovoltaic Specialists Conference (PVSC) PART 2","volume":"19 3","pages":"1-6"},"PeriodicalIF":0.0000,"publicationDate":"2013-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"+Three-step H2Se/Ar/H2S reaction of metal precursors for large area Cu(In,Ga)(Se,S)2 with uniform Ga distribution\",\"authors\":\"Kihwan Kim, Evan Kimberly, Andrew Damiani, G. Hanket, W. Shafarman\",\"doi\":\"10.1109/pvsc-vol2.2012.6656716\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A three-step H<inf>2</inf>Se/Ar/H<inf>2</inf>S reaction is used to process Cu-In-Ga metal precursors to form Cu(In,Ga)(Se,S)<inf>2</inf> films over 10 × 10 cm<sup>2</sup> substrates. The 1<sup>st</sup> selenization step gives fine microstructure with Ga accumulation near the Mo back contact, primarily in a Cu<inf>9</inf>Ga<inf>4</inf> phase. Significant grain growth with homogenous through-film Ga distribution is obtained by the 2<sup>nd</sup> Ar annealing step. The 3<sup>rd</sup> sulfization step completes the reaction process and incorporates S near the Cu(In,Ga)Se<inf>2</inf> surface. The resulting films show good adhesion and yielded devices with η = 14.8% and V<inf>OC</inf> = 612 mV.\",\"PeriodicalId\":6420,\"journal\":{\"name\":\"2012 IEEE 38th Photovoltaic Specialists Conference (PVSC) PART 2\",\"volume\":\"19 3\",\"pages\":\"1-6\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2012 IEEE 38th Photovoltaic Specialists Conference (PVSC) PART 2\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/pvsc-vol2.2012.6656716\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 IEEE 38th Photovoltaic Specialists Conference (PVSC) PART 2","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/pvsc-vol2.2012.6656716","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
+Three-step H2Se/Ar/H2S reaction of metal precursors for large area Cu(In,Ga)(Se,S)2 with uniform Ga distribution
A three-step H2Se/Ar/H2S reaction is used to process Cu-In-Ga metal precursors to form Cu(In,Ga)(Se,S)2 films over 10 × 10 cm2 substrates. The 1st selenization step gives fine microstructure with Ga accumulation near the Mo back contact, primarily in a Cu9Ga4 phase. Significant grain growth with homogenous through-film Ga distribution is obtained by the 2nd Ar annealing step. The 3rd sulfization step completes the reaction process and incorporates S near the Cu(In,Ga)Se2 surface. The resulting films show good adhesion and yielded devices with η = 14.8% and VOC = 612 mV.