硅膜片加工中凸角补偿模式的设计

Nam Chol Yu , Chung-Hyok Jon , KyongIl Chu , KumJun Ryang
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引用次数: 0

摘要

半导体压力传感器v型槽膜片的凸角补偿方法得到了广泛的介绍。然而,这些方法似乎不能有效地用于制造极薄的平方质量隔膜。为了制作不同厚度的薄硅膜片进行应力补偿,应建立凸角补偿方法,以保留方形凸角。本文设计了凸角补偿模式,使v型槽结构膜片具有质量,并通过合理的分析证明了该方法的优越性。
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Design of Convex Corner Compensation Pattern in Manufacturing of Si Diaphragms

The convex corner compensation methodes to manufacture diaphragms with V-grooves of semiconductor pressure sensors have been widely introduced. However, these methods do not seem to be efficiently used to manufacture very thin diaphragms with square masses. In order to make thin silicon diaphragms with different thicknesses where stresses are compensated, the convex corner compensation method to preserve square shaped convex corners should be established. In this paper, we have designed convex corner compensation patterns to make diaphragms of V-groove structures with mass and proved the superiority of this method by reasonable analysis.

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Design of Convex Corner Compensation Pattern in Manufacturing of Si Diaphragms A 1.3-mW 73.3-dB DR 10-MHz Bandwidth CT Delta-Sigma Modulator with a Charge-Recycled SC DAC and 52.7-dB Alias Rejection A capacitor-free fast-response low-dropout voltage regulator Empirical Study of the Cut-Off Frequency of Multi-Finger Nanometer MOS Transistor A 1.3-mW 73.3-dB DR 10-MHz Bandwidth CT Delta-Sigma Modulator with a Charge-Recycled SC DAC and 52.7-dB Alias Rejection
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