On-chip device and circuit diagnostics on advanced technology nodes by nanoprobing

M. K. Dawood, T. H. Ng, P. K. Tan, H. Tan, S. James, P. S. Limin, H. H. Yap, J. Lam, Z. Mai
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引用次数: 1

Abstract

It is becoming increasingly challenging for conventional failure analysis methods to identify the failure mechanism at circuit level in an integrated chip. This paper demonstrates the utilization of nanoprobing for on-chip device and circuit debugging for defect localization at circuit level. FIB circuit edit was first performed to isolate the intended circuit. Next nanoprobing was performed on higher metal layer to identify the cause of failure. Nanoprobing was then performed at the contact level to verify the source of failure.
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基于纳米探针的先进技术节点的片上器件和电路诊断
传统的失效分析方法越来越难以从电路层面识别集成芯片的失效机制。本文演示了纳米探针在片上器件中的应用,以及在电路级上对缺陷定位的电路调试。首先执行FIB电路编辑以隔离预期的电路。下一步,在更高的金属层上进行纳米探测,以确定故障的原因。然后在接触水平上进行纳米探测,以验证故障的来源。
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