Extraction of GeSn absorption coefficients from photodetector response

Kaiheng Ye, Wogong Zhang, M. Oehme, M. Schmid, M. Gollhofer, K. Kostecki, D. Widmann, E. Kasper, J. Schulze
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Abstract

Germanium tin (GeSn) shifts the photo-response of infrared (IR) light detectors from a typical cutoff wavelength of Ge detectors of 1550nm toward the mid infrared (MIR) [1]. The determination of the optical absorption coefficient of GeSn is difficult because it requires both high grade GeSn material and appropriate measurement structure. A series of vertical pin photodetector with the absorber material GeSn of excellent quality were fabricated achieving quantitative extraction of the absorption coefficient from photo-response. In this paper the fabrication of vertical GeSn photodetectors, the measurement of the background doping level in the intrinsic region (i-region) and the determination of the absorption coefficient are presented and the influence of high doped contact layers and electro-absorption effects from the built-in electric field are discussed.
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光电探测器响应中GeSn吸收系数的提取
锗锡(GeSn)使红外(IR)光探测器的光响应从锗探测器的典型截止波长1550nm转向中红外(MIR)[1]。GeSn的光学吸收系数的测定是一个难点,因为它既需要高质量的GeSn材料,又需要合适的测量结构。利用高质量的吸收材料GeSn制备了一系列垂直引脚光电探测器,实现了从光响应中定量提取吸收系数。本文介绍了垂直GeSn光电探测器的制作、本征区(i区)背景掺杂水平的测量和吸收系数的测定,并讨论了高掺杂接触层和内建电场的电吸收效应的影响。
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Direct band gap electroluminescence from bulk germanium at room temperature using an asymmetric metal/germanium/metal structure Extraction of GeSn absorption coefficients from photodetector response Effects of DC sputtering conditions on formation of Ge layers on Si substrates by sputter epitaxy method Low temperature growth of SiSn polycrystals with high Sn contents on insulating layers Study of Si-based Ge heteroepitaxy using RPCVD
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