Use of halide transport in epitaxial growth of InP and related compounds

K. Somogyi
{"title":"Use of halide transport in epitaxial growth of InP and related compounds","authors":"K. Somogyi","doi":"10.1109/ICIPRM.1996.492391","DOIUrl":null,"url":null,"abstract":"Summary form only given. In this paper methods and results in InP (and related compounds) growth practice are reviewed, classified and summarised on the basis of the recent literature. The aim is to show the present place and role of halogen transport in epitaxial growth. In the case of InP the importance of the classical hydride method is still high. Though MOVPE technique dominates in the case of growth of compounds with In content, atomic layer epitaxy and selective area growth are successful with auxiliary application of halogen transport. Chlorine assisted MOVPE has an increasing role.","PeriodicalId":268278,"journal":{"name":"Proceedings of 8th International Conference on Indium Phosphide and Related Materials","volume":"61 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-04-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 8th International Conference on Indium Phosphide and Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1996.492391","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Summary form only given. In this paper methods and results in InP (and related compounds) growth practice are reviewed, classified and summarised on the basis of the recent literature. The aim is to show the present place and role of halogen transport in epitaxial growth. In the case of InP the importance of the classical hydride method is still high. Though MOVPE technique dominates in the case of growth of compounds with In content, atomic layer epitaxy and selective area growth are successful with auxiliary application of halogen transport. Chlorine assisted MOVPE has an increasing role.
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卤化物输运在铟磷及相关化合物外延生长中的应用
只提供摘要形式。本文在文献综述的基础上,对InP(及相关化合物)生长实践的方法和结果进行了综述、分类和总结。目的是说明目前卤素输运在外延生长中的地位和作用。在InP的情况下,经典氢化物法的重要性仍然很高。虽然MOVPE技术在含铟化合物的生长中占主导地位,但在卤素输运的辅助应用下,原子层外延和选择性面积生长是成功的。氯助剂MOVPE的作用越来越大。
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