{"title":"On-wafer organic defect review and classification with universal surface enhanced Raman spectroscopy","authors":"A. Altun","doi":"10.1109/asmc54647.2022.9792487","DOIUrl":null,"url":null,"abstract":"The paper will introduce a novel 300mm wafer defect review and characterization technology based on universal on-wafer surface-enhanced Raman spectroscopy. The technology can perform high-throughput physical and chemical classification of defects using surface-enhanced optical images and enhanced Raman spectroscopy, respectively. The paper will demonstrate test data regarding size distributions, optical images and Raman spectra of particles of process liquids as well as test wafers.","PeriodicalId":436890,"journal":{"name":"2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-05-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/asmc54647.2022.9792487","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
The paper will introduce a novel 300mm wafer defect review and characterization technology based on universal on-wafer surface-enhanced Raman spectroscopy. The technology can perform high-throughput physical and chemical classification of defects using surface-enhanced optical images and enhanced Raman spectroscopy, respectively. The paper will demonstrate test data regarding size distributions, optical images and Raman spectra of particles of process liquids as well as test wafers.
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