O. Patterson, MD Golam Faruk, Datong Zhang, Guanchen He, B. Sheumaker
{"title":"Negative Mode E-Beam Inspection of the Contact Layer","authors":"O. Patterson, MD Golam Faruk, Datong Zhang, Guanchen He, B. Sheumaker","doi":"10.1109/asmc54647.2022.9792528","DOIUrl":null,"url":null,"abstract":"Contact CMP is one of the most popular layers for application of e-beam inspection. Using voltage contrast, contact opens and shorts may uniquely be detected. Generally positive surface charging (positive mode) is used, but negative surface charging (negative mode) provides a number of noteworthy advantages, including throughput, which are highlighted in this paper. Usually, adjustment of the landing energy or electric field is used to shift a wafer image into negative mode. This paper introduces and demonstrates a new control knob, beam density.","PeriodicalId":436890,"journal":{"name":"2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","volume":"47 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-05-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/asmc54647.2022.9792528","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
Contact CMP is one of the most popular layers for application of e-beam inspection. Using voltage contrast, contact opens and shorts may uniquely be detected. Generally positive surface charging (positive mode) is used, but negative surface charging (negative mode) provides a number of noteworthy advantages, including throughput, which are highlighted in this paper. Usually, adjustment of the landing energy or electric field is used to shift a wafer image into negative mode. This paper introduces and demonstrates a new control knob, beam density.
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