A Negative-Bias-Temperature-Instability Study on Omega-Gate Silicon Nanowire SOI pMOSFETs

V. Silva, G. Wirth, J. Martino, P. Agopian
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引用次数: 2

Abstract

The Negative-Bias-Temperature-Instability (NBTI) is an important reliability parameter for advanced technology nodes. This work presents an experimental study of NBTI in omega-gate nanowire (NW) pMOSFET. The 3D-numerical simulations were performed in order to better understand the NBTI effect in NW transistors. The results shows that NBTI in NW is high ($\Delta$ V $\approx200 -300$mV – for W = 10nm) due to the higher gate oxide electric field accelerating the NBTI effect providing a higher degradation. This study was performed for different channel widths and lengths.
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ω栅极硅纳米线SOI pmosfet负偏置温度不稳定性研究
负偏置温度不稳定性(NBTI)是先进技术节点的重要可靠性参数。本文提出了一种在ω栅极纳米线(NW) pMOSFET中进行NBTI的实验研究。为了更好地理解NW晶体管中的NBTI效应,进行了三维数值模拟。结果表明,NW中NBTI的性能高($\Delta$ V $\approx200 -300$ mV -对于W = 10nm),这是由于较高的栅极氧化物电场加速了NBTI效应,提供了较高的降解效果。本研究针对不同的通道宽度和长度进行。
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