Silicon quantum-dot transistors operating above 100 K

E. Leobandung, L. Guo, Y. Wang, S. Chou
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引用次数: 2

Abstract

Reports the fabrication and characterization of unique silicon quantum-dot transistors (QDTs) that demonstrate quantum as well as single-electron Coulomb blockade effects at temperatures above 100 K. They are also the first Si transistors that show interference between different modes of quantum waves in a cavity. The transistors were fabricated on SIMOX (separation by implanted oxygen) silicon wafer with the top silicon layer 70 nm thick.
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工作在100k以上的硅量子点晶体管
报道了独特的硅量子点晶体管(qdt)的制造和表征,该晶体管在100 K以上的温度下表现出量子和单电子库仑封锁效应。它们也是第一个显示出腔内不同模式量子波之间存在干扰的硅晶体管。晶体管采用SIMOX (separation by植入式氧分离)硅片制备,硅层厚度为70 nm。
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