Simultaneous Interface Defect Density and Differential Capacitance Imaging by Time-Resolved Scanning Nonlinear Dielectric Microscopy

K. Yamasue, Yasuo Cho
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Abstract

We investigate non-uniformity at SiO2/SiC interfaces by time-resolved scanning nonlinear dielectric microscopy, which permits the simultaneous nanoscale imaging of interface defect density (Dit) and differential capacitance (dC/dV) at insulator-semiconductor interfaces. Here we perform the cross correlation analysis of the images with spatially non-uniform clustering distributions reported previously. We show that Dit images are not correlated with the simultaneous dC/dV images significantly but with the difference image between the two dC/dV images taken with different voltage sweep directions. The results indicate that the dC/dV images visualize the non-uniformity of the total interface charge density and the difference images reflect that of Dit at a particular energy range.
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时间分辨扫描非线性介电显微镜同时成像界面缺陷密度和差分电容
我们利用时间分辨扫描非线性介电显微镜研究了SiO2/SiC界面的非均匀性,该显微镜允许同时对绝缘体-半导体界面的界面缺陷密度(Dit)和差分电容(dC/dV)进行纳米级成像。在这里,我们对先前报道的具有空间非均匀聚类分布的图像进行互相关分析。结果表明,Dit图像与同时拍摄的dC/dV图像没有显著的相关性,但与不同电压扫描方向下拍摄的两个dC/dV图像之间的差异图像相关。结果表明,dC/dV图像反映了界面总电荷密度的不均匀性,差像反映了Dit在特定能量范围内的不均匀性。
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