On the defect generation and low voltage extrapolation of Q/sub BD/ in SiO/sub 2//HfO/sub 2/ stacks

R. Degraeve, F. Crupi, D. Kwak, G. Groeseneken
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引用次数: 10

Abstract

The purpose of this paper is to demonstrate that at least a part of the initially present traps is indistinguishable from the electrically generated traps favouring the first interpretation. With this interpretation, we observe on our stack a trap generation threshold below which no degradation occurs, resulting in a virtually infinite Q/sub BD/ at low voltage. This optimistic result is, however, countered by the fact that the pre-stress traps dominate I/sub G/ at low V/sub G/ and limit the yield.
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SiO/ sub2 //HfO/ sub2 /堆中Q/sub / BD/的缺陷产生及低压外推
本文的目的是证明,至少有一部分最初存在的圈闭与有利于第一种解释的电生成圈闭无法区分。根据这种解释,我们在堆栈上观察到一个陷阱产生阈值,低于该阈值不会发生退化,从而在低电压下产生几乎无限的Q/sub BD/。然而,这种乐观的结果被这样一个事实所抵消,即预应力圈闭在低V/sub G/下占主导地位,并限制了产量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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