Exploration of rare earth materials for future interpoly dielectric replacement in Flash memory devices

D. Wellekens, S. Van Elshocht, C. Adelmann, J. Meersschaut, J. Swerts, J. Kittl, A. Cacciato, I. Debusschere, M. Jurczak, J. van Houdt
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引用次数: 4

Abstract

Rare-earth lanthanates and scandates have been studied for possible use as future Flash interpoly dielectrics. It was shown that a post-deposition anneal in O2 at high temperature (∼1000°C or above) gives rise to silicate formation. This results in excellent memory retention and larger robustness of the layers as compared to anneal in N2.
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在快闪记忆体装置中,未来内插电介质替代之稀土材料之探索
稀土镧酸盐和钪已经被研究作为未来Flash插补介质的可能性。结果表明,沉积后在O2中高温退火(~ 1000°C或更高)可产生硅酸盐。与在氮气中退火相比,这导致了优异的记忆保留和更大的层鲁棒性。
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Experimental characterization of SET seasoning on Phase Change Memory arrays Flexible and transparent ReRAM with GZO-memory-layer and GZO-electrodes on large PEN sheet NBTI stress relaxation design for scaling high-voltage transistors in NAND Flash memories Exploration of rare earth materials for future interpoly dielectric replacement in Flash memory devices Technology challenges for deep-nano semiconductor
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