Semiconductor Failure Analysis in Automotive Industry at BMW: from X-Ray Microscopy to ToF-SIMS Measurements on a STEM Lamella

D. Braun, S. Diez, J. Kopitzke
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Abstract

Considering the growing need for the use of semiconductors in the automotive industry, this paper aims to describe the analyzing process from an automotive manufacturer point of view. The use of X-Ray Microscopy and a combination of ToF-SIMS and FIB are shown.
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宝马汽车工业中的半导体失效分析:从x射线显微镜到STEM薄片上的ToF-SIMS测量
考虑到汽车工业对半导体使用的需求日益增长,本文旨在从汽车制造商的角度描述分析过程。显示了x射线显微镜的使用以及ToF-SIMS和FIB的组合。
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