Power switch optimization and sizing in 65nm PD-SOI considering supply voltage noise

J. Le Coz, A. Valentian, P. Flatresse, M. Belleville
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引用次数: 3

Abstract

In this paper, several power gating solutions are analysed in 65nm PDSOI technology, taking into account the implementation area. A new figure of merit has been proposed to easily determine the best tradeoff between leakage, drive current and area. It shows that the best solution is to use a Body-Contacted transistor with a non-minimal gate length, enabling leakage currents of the same order of magnitude than in Bulk. A second analysis on specific PD-SOI Logic CORE electrical behaviour has been performed. This analysis allows determining the power switch network sizing implementation taking into account decoupling capacitance, ON Logic CORE current and equivalent parasitic supply inductance.
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考虑电源电压噪声的65nm PD-SOI电源开关优化和尺寸
本文分析了65nm PDSOI技术的几种功率门控解决方案,并考虑了实现领域。提出了一种新的性能指标,以方便地确定泄漏、驱动电流和面积之间的最佳权衡。结果表明,最佳解决方案是使用具有非最小栅极长度的体接触晶体管,使漏电流与Bulk具有相同的数量级。对特定的PD-SOI逻辑核心电气行为进行了第二次分析。该分析允许在考虑去耦电容、ON Logic CORE电流和等效寄生电源电感的情况下确定功率开关网络的尺寸实现。
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