InGaAs/GaAs strained quantum wires grown by OMCVD on corrugated substrates

F. Lelarge, K. Leifer, A. Condó, V. Iakovlev, E. Martinet, C. Constantin, A. Rudra, E. Kapon
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引用次数: 2

Abstract

Self-ordered, strained InGaAs/GaAs quantum structures are grown on V-grooved GaAs substrates. Indium segregation at the bottom of the groove results in the formation of a vertical InGaAs quantum well structure with In-enriched composition. The lateral definition permits the growth of defect-free strained structures with thickness exceeding that achieved with planar epitaxy. We study the influence of the nominal thickness and In content on the photoluminescence peak wavelength of V-grooved quantum wires. Finally, room temperature emission at 1.12 /spl mu/m with relatively narrow linewidth (30-35 meV) is demonstrated.
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在波纹衬底上OMCVD生长InGaAs/GaAs应变量子线
在v型沟槽GaAs衬底上生长了自有序、应变的InGaAs/GaAs量子结构。凹槽底部的铟偏析形成了富in成分的垂直InGaAs量子阱结构。横向定义允许生长厚度超过平面外延的无缺陷应变结构。研究了v槽量子线标称厚度和In含量对其光致发光峰值波长的影响。最后,展示了1.12 /spl mu/m的室温发射,相对较窄的线宽(30-35 meV)。
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