C. Y. Chen, L. Goux, A. Fantini, A. Redolfi, G. Groeseneken, M. Jurczak
{"title":"Oxygen chemical potential profile optimization for fast low current (<10μA) resistive switching in oxide-based RRAM","authors":"C. Y. Chen, L. Goux, A. Fantini, A. Redolfi, G. Groeseneken, M. Jurczak","doi":"10.1109/VLSI-TSA.2016.7480500","DOIUrl":null,"url":null,"abstract":"We explain in detail how to optimize the oxygen chemical potential profile of Ta2O5-based stack to improve switching speed at reduced operating current (<;10μA). Using industry-relevant programming scheme, we demonstrate an oxide-based RRAM stack giving large on/off ratio (~x200) while the good reliability properties are preserved.","PeriodicalId":441941,"journal":{"name":"2016 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)","volume":"123 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-04-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSI-TSA.2016.7480500","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
We explain in detail how to optimize the oxygen chemical potential profile of Ta2O5-based stack to improve switching speed at reduced operating current (<;10μA). Using industry-relevant programming scheme, we demonstrate an oxide-based RRAM stack giving large on/off ratio (~x200) while the good reliability properties are preserved.