Degradation mapping of IGZO TFTs

P. Rinaudo, A. Chasin, J. Franco, Z. Wu, N. Rassoul, R. Delhougne, B. Kaczer, I. Wolf, G. Kar
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Abstract

We studied the impact of gate and drain stress biases combination on IGZO based TFTs degradation targeting hot carrier regime. We show that typical signatures of this mechanism (e.g., saturation current degradation and SS increase) are not visible even at high drain biases, while a gate bias dependence only (BTI) is present in most of the degradation data.
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IGZO tft的退化映射
我们研究了栅极和漏极应力偏差组合对基于IGZO的TFTs热载流子降解的影响。我们发现,即使在高漏极偏置下,这种机制的典型特征(例如,饱和电流退化和SS增加)也不可见,而大多数退化数据中仅存在栅极偏置依赖(BTI)。
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Summary of Tutorials Gate-to-drain/source overlap and asymmetry effects on hot-carrier generation Degradation mapping of IGZO TFTs Discussion Group II – Circuit Reliability Impact of Single Defects on NBTI and PBTI Recovery in SiO2 Transistors
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