Progress on quantum transport simulation using empirical pseudopotentials

Jingtian Fang, W. Vandenberghe, M. Fischetti
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引用次数: 1

Abstract

After performing one-dimensional simulation of electron transport in narrow quantum wires without gate control in (Fang et al., 2014) and (Fu and Fischetti, 2013) using the open boundary-conditions full-band plane-wave transport formalism derived in (Fu, 2013), we now extend the work to simulate three-dimensionally field-effect transistors (FETs) with a gate bias applied and obtain their transport characteristics. We optimize multiple procedures for solving the quantum transport equation (QTE), such as using a selected eigenvalue solver, the fast Fourier transform (FFT), block assignment of matrices, a sparse matrix solver, and parallel computing techniques. With an expanded computing capability, we are able to simulate the transistors in the sub- 1 nm technology node as suggested by the ITRS, which features 5 nm physical gate length, 2 nm body thick6ness, 0.4 nm effective oxide thickness (EOT), 0.6 V power supply voltage, and a multi-gate structure. Here we simulate an armchair graphene nanoribbon (aGNR) FET using a gateall- around architecture and obtain its transport properties. We will discuss the numerics concerning the matrix size of the transport equation, memory consumption, and simulation time.
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基于经验赝势的量子输运模拟研究进展
在(Fang et al., 2014)和(Fu and Fischetti, 2013)中使用(Fu, 2013)中导出的开放边界条件全带平面波输运形式对没有栅极控制的窄量子线中的电子输运进行一维模拟后,我们现在将工作扩展到模拟应用栅极偏置的三维场效应晶体管(fet)并获得其输运特性。我们优化了求解量子输运方程(QTE)的多个过程,例如使用选择的特征值求解器、快速傅立叶变换(FFT)、矩阵的块分配、稀疏矩阵求解器和并行计算技术。利用扩展的计算能力,我们能够模拟ITRS建议的亚1nm技术节点上的晶体管,其物理栅极长度为5nm,体厚为2nm,有效氧化物厚度(EOT)为0.4 nm,供电电压为0.6 V,采用多栅极结构。本文采用门环结构模拟了扶手椅型石墨烯纳米带场效应管,并获得了其输运特性。我们将讨论有关传输方程的矩阵大小、内存消耗和模拟时间的数值。
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