Thin Layers Obtained by Plasma Process for Emerging Non-Volatile Memory (RRAM) Applications

E. Souchier, L. Cario, B. Corraze, C. Estournès, V. Fernandez, T. Skotnicki, P. Mazoyer, E. Janod, M. Besland
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引用次数: 4

Abstract

In that work, we show that RF magnetron sputtering can be used to obtain pure and crystallized thin layers of GaV 4 S 8 films with a well controlled composition, depending mainly on RF power and deposition pressure. The obtained layers exhibit similar structural and physical properties as GaV 4 S 8 polycrystal or crystal. In addition, we have successfully demonstrated that a reversible resistive switching can also be obtained on thin layers. Electrical measurements will be further investigated on thinner layers and for shorter pulse time. Nevertheless, these preliminary results obtained on Au/Si substrates are very promising for further RRAM applications.
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新出现的非易失性存储器(RRAM)应用中等离子体工艺获得的薄层
在这项工作中,我们证明了射频磁控溅射可以用于获得具有良好控制成分的纯晶化gav4s8薄膜薄层,主要取决于射频功率和沉积压力。所得层具有与gav4s8多晶或晶体相似的结构和物理性质。此外,我们还成功地证明了在薄层上也可以获得可逆的电阻开关。电测量将进一步研究更薄的层和更短的脉冲时间。尽管如此,这些在Au/Si衬底上获得的初步结果对于进一步的RRAM应用非常有希望。
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