{"title":"Optical maskless lithography for fast and low-cost design to wafer","authors":"L. Hsu","doi":"10.1109/SMTW.2004.1393741","DOIUrl":null,"url":null,"abstract":"Increasing market pressures force design and manufacturing communities to come up with innovative and flexible design and manufacturing solutions to control cost and time to market. This work shows that optical maskless lithography (OML), requiring no mask at all, has lowest cost and shortest design-to-wafer times while keeping transparency to mask-based optical lithography and allowing for resolution enhancement via known low-k/sub 1/ imaging methods such as hard phase shifting and strong OPC.","PeriodicalId":369092,"journal":{"name":"2004 Semiconductor Manufacturing Technology Workshop Proceedings (IEEE Cat. No.04EX846)","volume":"223 ","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2004 Semiconductor Manufacturing Technology Workshop Proceedings (IEEE Cat. No.04EX846)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMTW.2004.1393741","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Increasing market pressures force design and manufacturing communities to come up with innovative and flexible design and manufacturing solutions to control cost and time to market. This work shows that optical maskless lithography (OML), requiring no mask at all, has lowest cost and shortest design-to-wafer times while keeping transparency to mask-based optical lithography and allowing for resolution enhancement via known low-k/sub 1/ imaging methods such as hard phase shifting and strong OPC.
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