Novel Silver-seed Semi-Additive Process for High Quality Circuit Formation

Norimasa Fukazawa, Akira Murakawa, Wataru Fujikawa, Jun Shirakami
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引用次数: 2

Abstract

We propose a novel silver-seed semi-additive process (S-SAP) for fabricating electrical circuit of high quality. Thin coated silver layer is used as a conductive seed for plating and is easily removed by selective etching without defects of plated copper wirings. In this system, it was found that the reproducibility of the designed circuit design and the rectangular shape of the wiring are maintained. Therefore, this process has great advantages against the conventional MSAP utilizing copper seed. Here, we will report the results of demonstration of electrical circuit fabrication by silver-seed SAP and discuss the difference between the new process (S-SAP) and conventional Cu-MSAP.
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新型银籽半添加工艺制备高质量电路
我们提出了一种新的银籽半添加工艺(S-SAP),用于制造高质量的电路。薄镀银层用作电镀的导电种子,通过选择性蚀刻很容易去除,没有镀铜线的缺陷。结果表明,该系统保持了电路设计的可重复性和线路的矩形形状。因此,与传统的铜种子MSAP相比,该工艺具有很大的优势。在这里,我们将报告用银籽SAP制造电路的演示结果,并讨论新工艺(S-SAP)与传统Cu-MSAP的区别。
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