K. Watanabe, H. Nishiyama, M. Noguchi, D. Fujiki, K. Nemoto
{"title":"Real-time dark field size measurement method for yield impact evaluation","authors":"K. Watanabe, H. Nishiyama, M. Noguchi, D. Fujiki, K. Nemoto","doi":"10.1109/ISSM.2000.993668","DOIUrl":null,"url":null,"abstract":"A practical method for in-line particle size measurement called real-time dark field size measurement has been developed. Size measurement data possessing a good correlation coefficient (R/sup 2/=0.7) by this method has been acquired using high-sensitivity dark field laser-scanning inspection tools. As a result, it is possible to evaluate yield impact properly even with high-sensitivity dark field laser-scanning inspection tools.","PeriodicalId":104122,"journal":{"name":"Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)","volume":"67 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-09-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.2000.993668","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
A practical method for in-line particle size measurement called real-time dark field size measurement has been developed. Size measurement data possessing a good correlation coefficient (R/sup 2/=0.7) by this method has been acquired using high-sensitivity dark field laser-scanning inspection tools. As a result, it is possible to evaluate yield impact properly even with high-sensitivity dark field laser-scanning inspection tools.
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