Jisuk Kim, Earl Kim, Daehyeon Lee, Taeheon Lee, Daesik Ham, Miju Yang, Wanha Hwang, Jaeyoung Kim, Sangyong Yoon, Youngwook Jeong, Eun-Kyoung Kim, Ki-Whan Song, J. Song, Myungsuk Kim, W. Choi
{"title":"Machine Learning-Based Optimization Technique for High-Capacity V-NAND Flash Memory","authors":"Jisuk Kim, Earl Kim, Daehyeon Lee, Taeheon Lee, Daesik Ham, Miju Yang, Wanha Hwang, Jaeyoung Kim, Sangyong Yoon, Youngwook Jeong, Eun-Kyoung Kim, Ki-Whan Song, J. Song, Myungsuk Kim, W. Choi","doi":"10.31399/asm.cp.istfa2021p0020","DOIUrl":null,"url":null,"abstract":"\n In the NAND flash manufacturing process, thousands of internal electronic fuses (eFuse) should be tuned in order to optimize performance and validity. In this paper, we propose a machine learning-based optimization technique that can automatically tune the individual eFuse value based on a deep learning and genetic algorithm. Using state-of-the-art triple-level cell (TLC) V-NAND flash wafers, we trained our model and validated its effectiveness. The experimental results show that our technique can automatically optimize NAND flash memory, thus reducing total turnaround time (TAT) by 70 % compared with the manual-based process.","PeriodicalId":188323,"journal":{"name":"ISTFA 2021: Conference Proceedings from the 47th International Symposium for Testing and Failure Analysis","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-10-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ISTFA 2021: Conference Proceedings from the 47th International Symposium for Testing and Failure Analysis","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.31399/asm.cp.istfa2021p0020","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
In the NAND flash manufacturing process, thousands of internal electronic fuses (eFuse) should be tuned in order to optimize performance and validity. In this paper, we propose a machine learning-based optimization technique that can automatically tune the individual eFuse value based on a deep learning and genetic algorithm. Using state-of-the-art triple-level cell (TLC) V-NAND flash wafers, we trained our model and validated its effectiveness. The experimental results show that our technique can automatically optimize NAND flash memory, thus reducing total turnaround time (TAT) by 70 % compared with the manual-based process.