Analysis of vacancy defects in hybrid graphene-boron nitride armchair nanoribbon based n-MOSFET at ballistic limit

A. Chanana, S. Mahaptra, A. Sengupta
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引用次数: 1

Abstract

Here, we report the performance of vacancy affected supercell of a hybrid Graphene-Boron Nitride embedded armchair nanoribbon (a-GNR-BN) based n-MOSFET at its ballistic transport limit using Non Equilibrium Green's Function (NEGF) methodology. A supercell is made of the 3p configuration of armchair nanoribbon that is doped on the either side with 6 BN atoms and is also H-passivated. The type of vacancies studied are mono (B removal), di (B and N atom removal) and hole (removal of 6 atoms) formed all at the interface of carbon and BN atoms. Density Functional Theory (DFT) is employed to evaluate the material properties of this supercell like bandgap, effective mass and density of states (DOS). Further band gap and effective mass are utilized in self-consistent Poisson- Schrodinger calculator formalized using NEGF approach. For all the vacancy defects, material properties show a decrease which is more significant for hole defects. This observation is consistent in the device characteristics as well where ON-current (ION) and Sub Threshold Slope (SS) shows the maximum increment for hole vacancy and increase is more significant becomes when the number of defects increase.
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弹道极限下石墨烯-氮化硼扶手型纳米带n-MOSFET的空位缺陷分析
本文采用非平衡格林函数(NEGF)方法,研究了空位影响石墨烯-氮化硼嵌套armchair纳米带(a- gnr - bn)的n-MOSFET在弹道输运极限下的超级细胞性能。超级单体是由扶手椅纳米带的3p结构组成的,扶手椅纳米带的两侧分别掺杂了6个BN原子,并进行了h钝化。所研究的空位类型有单位(去除B原子)、双位(去除B和N原子)和空穴(去除6个原子),均形成于碳原子和BN原子的界面。利用密度泛函理论(DFT)评价了该超级单体的带隙、有效质量和态密度等材料性能。在用NEGF方法形式化的自洽泊松-薛定谔计算器中进一步利用了带隙和有效质量。对于所有的空位缺陷,材料性能都有下降,其中孔洞缺陷的下降更为明显。这一观察结果在器件特性中也是一致的,其中导通电流(ION)和亚阈值斜率(SS)显示空穴空位的最大增量,并且随着缺陷数量的增加,增加更为显著。
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