Improved structural and optical properties of InGaAsP grown on InP by ECR plasma-assisted epitaxy

R. LaPierre, B. Robinson, D. A. Thompson
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Abstract

In this work, plasma-assisted epitaxy is be shown to be an alternative technique for reducing the lateral composition modulation (LCM) in thick InGaAsP layers and single quantum wells (QWs) grown on (100) InP substrates.
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用ECR等离子体辅助外延技术改善InP上生长的InGaAsP的结构和光学性能
在这项工作中,等离子体辅助外延被证明是一种替代技术,用于减少在(100)InP衬底上生长的厚InGaAsP层和单量子阱(qw)中的横向组成调制(LCM)。
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