{"title":"ICP-RIE Platinum (Pt) sputter etching","authors":"R. Mendaros, M. Marcelo","doi":"10.1109/IPFA.2014.6898195","DOIUrl":null,"url":null,"abstract":"One of the coating materials that is used to reduced electron charging effect during Scanning Electron Microscope (SEM) imaging is Platinum (Pt). Removing Pt coating for parts requiring further electrical testing or deprocessing has been a challenge in failure analysis. This paper discusses the established methodology in removing Pt coating using the ICP-RIE sputter etching technique.","PeriodicalId":409316,"journal":{"name":"Proceedings of the 21th International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)","volume":"51 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 21th International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IPFA.2014.6898195","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

One of the coating materials that is used to reduced electron charging effect during Scanning Electron Microscope (SEM) imaging is Platinum (Pt). Removing Pt coating for parts requiring further electrical testing or deprocessing has been a challenge in failure analysis. This paper discusses the established methodology in removing Pt coating using the ICP-RIE sputter etching technique.
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ICP-RIE铂(Pt)溅射腐蚀
在扫描电子显微镜(SEM)成像中,用于降低电子充电效应的涂层材料之一是铂(Pt)。在故障分析中,去除需要进一步电气测试或去加工的部件的铂涂层一直是一个挑战。本文讨论了采用ICP-RIE溅射蚀刻技术去除Pt涂层的既定方法。
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