High reflectivity laser facets by deeply etched DBR buried with benzocyclobutene

M. M. Raj, J. Wiedmann, Y. Saka, H. Yasumoto, S. Arai
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Abstract

Lasers having a DBR facet on one side of the cavity were fabricated in a simple process using one step electron beam (EB) lithography and CH/sub 4//H/sub 2/-reactive ion etching (RIE). The DBR structure consists of deeply etched 3/spl lambda//4 wide grooves, which are buried with benzocyclobutene (BCB) polymer so as to reduce diffraction loss, spaced 3h/4 apart. The reflectivity of the DBR was estimated from the threshold current dependence on cavity length and an output power ratio from the front to the rear facets to be as high as 96% for 10 element DBR.
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高反射率激光切面的深蚀刻DBR埋与苯并环丁烯
采用一步电子束(EB)光刻和CH/sub 4//H/sub 2/-反应离子刻蚀(RIE)工艺,制备了在腔体一侧具有DBR facet的激光器。DBR结构由深蚀刻的3/spl λ //4宽沟槽组成,沟槽内埋入苯并环丁烯(BCB)聚合物以减少衍射损失,沟槽间距为3h/4。根据阈值电流对腔长的依赖性和前后侧的输出功率比,DBR的反射率估计为10元DBR高达96%。
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