Fully Depleted Double-Gate 1T-DRAM Cell with NVM Function for High Performance and High Density Embedded DRAM

Ki-Heung Park, Young Min Kim, H. Kwon, S. Kong, Jong-Ho Lee
{"title":"Fully Depleted Double-Gate 1T-DRAM Cell with NVM Function for High Performance and High Density Embedded DRAM","authors":"Ki-Heung Park, Young Min Kim, H. Kwon, S. Kong, Jong-Ho Lee","doi":"10.1109/IMW.2009.5090592","DOIUrl":null,"url":null,"abstract":"We have investigated a fully depleted double-gate 1-T DRAM cell device which has SONOS type storage node on control gate for nonvolatile memory function. Due to enlarged hole capacity by the large storage node and source/drain junction depth control in the floating body, we could improving data retention time, I s ,(write\"1\")/I s ,(write\"0\") and device scalability. Proposed device could be a very promising candidate for a future high density and high performance IT-DRAM cell.","PeriodicalId":113507,"journal":{"name":"2009 IEEE International Memory Workshop","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-05-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 IEEE International Memory Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMW.2009.5090592","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

Abstract

We have investigated a fully depleted double-gate 1-T DRAM cell device which has SONOS type storage node on control gate for nonvolatile memory function. Due to enlarged hole capacity by the large storage node and source/drain junction depth control in the floating body, we could improving data retention time, I s ,(write"1")/I s ,(write"0") and device scalability. Proposed device could be a very promising candidate for a future high density and high performance IT-DRAM cell.
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具有NVM功能的全耗尽双栅1T-DRAM单元,用于高性能高密度嵌入式DRAM
我们研究了一种完全耗尽的双栅1-T DRAM单元器件,该器件在控制栅上具有SONOS类型的存储节点,用于非易失性存储功能。由于大存储节点和浮体源/漏结深度控制扩大了孔容量,我们可以提高数据保留时间I s,(写“1”)/I s,(写“0”)和器件可扩展性。该器件可能是未来高密度高性能IT-DRAM电池的一个非常有前途的候选器件。
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