Low-frequency noise in lattice-matched In/sub 0.52/Al/sub 0.48/As/In/sub 0.53/Ga/sub 0.47/As/InP HEMTs

L. Ren, M. Py, J. Spicher, H. Buehlmann, H. Beck, M. Ilegems
{"title":"Low-frequency noise in lattice-matched In/sub 0.52/Al/sub 0.48/As/In/sub 0.53/Ga/sub 0.47/As/InP HEMTs","authors":"L. Ren, M. Py, J. Spicher, H. Buehlmann, H. Beck, M. Ilegems","doi":"10.1109/ICIPRM.1996.492258","DOIUrl":null,"url":null,"abstract":"Low-frequency drain-current noise in lattice-matched InAlAs/InGaAs/InP HEMTs has been studied at low drain bias in a temperature range of 77 to 350 K. The 1/f noise was found to be strongly dependent on gate-source bias, which can be interpreted by taking into account the role played by the series resistance. The Hooge's parameters for 1/f noise were extracted to be 1.5/spl times/10/sup -3/ for the InGaAs channel and 7/spl times/10/sup -4/ for the series resistance. Noise spectra analysis reveals two generation-recombination (G-R) noise components, which correspond to two traps with activation energies of 0.56 eV and 0.11 eV. Considering their different behavior upon gate-source bias and the DLTS results, we conclude that the 0.11 eV trap is located in the channel region while the 0.56 eV trap is most likely located in the Schottky barrier layer.","PeriodicalId":268278,"journal":{"name":"Proceedings of 8th International Conference on Indium Phosphide and Related Materials","volume":"13 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-04-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 8th International Conference on Indium Phosphide and Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1996.492258","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

Low-frequency drain-current noise in lattice-matched InAlAs/InGaAs/InP HEMTs has been studied at low drain bias in a temperature range of 77 to 350 K. The 1/f noise was found to be strongly dependent on gate-source bias, which can be interpreted by taking into account the role played by the series resistance. The Hooge's parameters for 1/f noise were extracted to be 1.5/spl times/10/sup -3/ for the InGaAs channel and 7/spl times/10/sup -4/ for the series resistance. Noise spectra analysis reveals two generation-recombination (G-R) noise components, which correspond to two traps with activation energies of 0.56 eV and 0.11 eV. Considering their different behavior upon gate-source bias and the DLTS results, we conclude that the 0.11 eV trap is located in the channel region while the 0.56 eV trap is most likely located in the Schottky barrier layer.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
栅格匹配in /sub 0.52/Al/sub 0.48/As/ in /sub 0.53/Ga/sub 0.47/As/InP HEMTs中的低频噪声
研究了晶格匹配InAlAs/InGaAs/InP hemt在77 ~ 350 K低漏极偏置条件下的低频漏极电流噪声。发现1/f噪声强烈依赖于栅极源偏置,这可以通过考虑串联电阻所起的作用来解释。提取1/f噪声的Hooge参数为InGaAs通道的1.5/spl倍/10/sup -3/和串电阻的7/spl倍/10/sup -4/。噪声谱分析显示了两种生成复合(G-R)噪声分量,对应于两个活化能分别为0.56 eV和0.11 eV的陷阱。考虑到它们对栅极源偏置的不同行为和dlt结果,我们得出结论,0.11 eV的陷阱位于通道区域,而0.56 eV的陷阱最有可能位于肖特基势垒层。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
In-situ surface preparation of InP-based semiconductors prior to direct UVCVD silicon nitride deposition for passivation purposes An unified GSMBE growth model for GaInAsP on InP and GaAs Growth of Al/sub 0.48/In/sub 0.52/As/Ga/sub 0.47/In/sub 0.53/As heterostructures lattice relaxed on GaAs and lattice matched on InP Active circulator MMIC in CPW technology using quarter micron InAlAs/InGaAs/InP HFETs Realisation of silicon based dielectrics anti-resonant reflecting optical waveguide (ARROW) on InP by photochemical deposition
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1