Theodor Hillebrand, Nico Hellwege, N. Heidmann, S. Paul, D. Peters-Drolshagen
{"title":"Charge-based stochastic aging analysis of CMOS circuits","authors":"Theodor Hillebrand, Nico Hellwege, N. Heidmann, S. Paul, D. Peters-Drolshagen","doi":"10.1109/IIRW.2015.7437084","DOIUrl":null,"url":null,"abstract":"Scaled down CMOS transistors are prone to degradation and process variation. This necessitates a transistor model that provides an insight into the internal dependencies between these two crucial effects. Models for modern transistors and their degradation behavior are hardly attachable. This paper proposes a modified BSIM6 model which includes degradation due to BTI and HCI and in addition process variations. The application of this method is demonstrated on the basis of a single MOSFET and an inverter stage. The results can be used in the gm/Id work flow or for yield estimation on circuit level.","PeriodicalId":120239,"journal":{"name":"2015 IEEE International Integrated Reliability Workshop (IIRW)","volume":"57 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 IEEE International Integrated Reliability Workshop (IIRW)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IIRW.2015.7437084","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
Abstract
Scaled down CMOS transistors are prone to degradation and process variation. This necessitates a transistor model that provides an insight into the internal dependencies between these two crucial effects. Models for modern transistors and their degradation behavior are hardly attachable. This paper proposes a modified BSIM6 model which includes degradation due to BTI and HCI and in addition process variations. The application of this method is demonstrated on the basis of a single MOSFET and an inverter stage. The results can be used in the gm/Id work flow or for yield estimation on circuit level.