A. Papp, F. Bieringer, D. Koch, H. Kammer, A. Kohlhase, A. Lill, A. Preussger, A. Schlemm, M. Schneegans
{"title":"Implementation of a WLR-program into a production line","authors":"A. Papp, F. Bieringer, D. Koch, H. Kammer, A. Kohlhase, A. Lill, A. Preussger, A. Schlemm, M. Schneegans","doi":"10.1109/IRWS.1995.493575","DOIUrl":null,"url":null,"abstract":"Describes the implementation of a process reliability monitoring program on the basis of wafer level tests into the control concept of a production line. For the main reliability parameters-gate oxide integrity, hot carrier injection immunity and metallization stability against electromigration-the methods, test structures, test conditions and results are presented. Some examples for reliability improvement and the future targets of the WLR-program are given.","PeriodicalId":355898,"journal":{"name":"IEEE 1995 International Integrated Reliability Workshop. Final Report","volume":"95 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-10-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE 1995 International Integrated Reliability Workshop. Final Report","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRWS.1995.493575","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 9
Abstract
Describes the implementation of a process reliability monitoring program on the basis of wafer level tests into the control concept of a production line. For the main reliability parameters-gate oxide integrity, hot carrier injection immunity and metallization stability against electromigration-the methods, test structures, test conditions and results are presented. Some examples for reliability improvement and the future targets of the WLR-program are given.
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