Intrinsic Voltage Gain and Unit-Gain Frequency of Omega-Gate Nanowire SOI MOSFETs

W. Perina, J. Martino, P. Agopian
{"title":"Intrinsic Voltage Gain and Unit-Gain Frequency of Omega-Gate Nanowire SOI MOSFETs","authors":"W. Perina, J. Martino, P. Agopian","doi":"10.1109/SBMicro.2019.8919278","DOIUrl":null,"url":null,"abstract":"This paper shows the influence of channel width (W<inf>NW</inf>) and channel length (L) on intrinsic voltage gain (A<inf>V</inf>) and on unit-gain frequency (f<inf>t</inf>) of omega-gate nanowire SOI MOSFET. The f<inf>t</inf> is calculated taking into consideration the experimental gate capacitance. The device showed excellent electrostatic control for the W<inf>NW</inf> of 10 nm, which improved transconductance, consequently, improving both A<inf>V</inf> and f<inf>t</inf>. This technology showed values of A<inf>V</inf> around 80 dB and a f<inf>t</inf> of over 200 GHz, proving that this device is an excellent for future analog applications like 5G communications and Internet-of-Things (IoT).","PeriodicalId":403446,"journal":{"name":"2019 34th Symposium on Microelectronics Technology and Devices (SBMicro)","volume":"81 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 34th Symposium on Microelectronics Technology and Devices (SBMicro)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SBMicro.2019.8919278","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

Abstract

This paper shows the influence of channel width (WNW) and channel length (L) on intrinsic voltage gain (AV) and on unit-gain frequency (ft) of omega-gate nanowire SOI MOSFET. The ft is calculated taking into consideration the experimental gate capacitance. The device showed excellent electrostatic control for the WNW of 10 nm, which improved transconductance, consequently, improving both AV and ft. This technology showed values of AV around 80 dB and a ft of over 200 GHz, proving that this device is an excellent for future analog applications like 5G communications and Internet-of-Things (IoT).
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
ω栅极纳米线SOI mosfet的固有电压增益和单位增益频率
研究了沟道宽度(WNW)和沟道长度(L)对ω栅极纳米线SOI MOSFET本征电压增益(AV)和单位增益频率(ft)的影响。计算时考虑了实验栅电容。该器件在WNW为10 nm时表现出出色的静电控制,从而改善了跨导性,从而提高了AV和ft。该技术显示AV值约为80 dB, ft值超过200 GHz,证明该器件非常适合未来的模拟应用,如5G通信和物联网(IoT)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Low Saturation Onset MOS Transistor: an Equivalent Network Synthesis and Electrical properties of polyaniline yielded in nickel sulfate salt A Negative-Bias-Temperature-Instability Study on Omega-Gate Silicon Nanowire SOI pMOSFETs Comparasion between TiO2 thin films deposited by DC and RF sputtering. A 4 mm toroidal microtransformer built with wire bonding and MCM technologies
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1