Reversible dielectric breakdown in h-BN stacks: a statistical study of the switching voltages

J. Roldán, D. Maldonado, F. Jiménez-Molinos, Christian Acal, J. E. Ruiz-Castro, A. M. Aguilera, F. Hui, J. Kong, Y. Shi, X. Jing, Chao Wen, M. A. Villena, M. Lanza
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引用次数: 3

Abstract

Memristor devices with the Au/Ag/h-BN/Fe structure have been fabricated and characterized. The switching voltages, and other newly-defined parameters extracted, like V2dmax1 and V2dmax2, have been analyzed statistically in an exhaustive manner. The conduction across the memristor can be described well with a Quantum Point Contact (QPC) model that accounts for quantized filamentary conduction. The distributions of set and reset voltages have been proved to be accurately reproduced by using Weibull distributions. We also present an analysis making use of phase-type distributions to characterize the measured data stochasticity.
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可逆介质击穿在h-BN堆:开关电压的统计研究
制备了Au/Ag/h-BN/Fe结构的忆阻器器件,并对其进行了表征。开关电压和其他新定义的提取参数,如V2dmax1和V2dmax2,已经进行了详尽的统计分析。通过忆阻器的传导可以用量子点接触(QPC)模型很好地描述,该模型考虑了量子化的丝状传导。用威布尔分布可以准确地再现设定电压和复位电压的分布。我们还提出了一个分析,利用相型分布来表征测量数据的随机性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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