Γ-X Transfer in Tunneling through Single AlAs Barriers

D. Landheer, H. Liu, M. Buchanan, R. Stoner
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Abstract

When electrons tunnel through a single barrier of AlAs between GaAs contact layers there is a possibility of transfer from the Γ-conduction band to the X-band.1,2,3 The basic mechanism for Γ-X transfer based on the model of Liu 3 is shown in Fig. 1 along with Γ (solid lines) and X (dashed lines) conduction-band profiles for a 5.2 nm AlAs barrier. A Γ-electron can (1) tunnel through the entire structure without transfer, it can (2) transfer to the X-minimum at the first interface and propagate through the AlAs layer before transferring back to the Γ-minimum, or it can (3) transfer to the X-minimum at the first interface and propagate through the whole structure. The transfer at the interfaces is described by an interaction vertex VΓX or a coupling parameter α as described in Ref. 3. The process (2) is relatively unimportant at low applied potentials but becomes dominant above about 0.3 V where the Fermi energy has crossed the X-band in the AlAs.
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Γ-X通过单一屏障的隧道传输
当电子隧穿砷化镓接触层之间的单一势垒时,有可能从Γ-conduction波段转移到x波段。基于Liu 3模型的Γ-X转移的基本机制如图1所示,以及5.2 nm AlAs势垒的Γ(实线)和X(虚线)导带分布图。Γ-electron可以(1)在不传输的情况下隧道穿过整个结构,也可以(2)在第一个接口上传输到X-minimum并通过AlAs层传播后再传输回Γ-minimum,或者(3)在第一个接口上传输到X-minimum并传播到整个结构。界面上的传递由相互作用顶点VΓX或耦合参数α描述,如文献3所述。在较低的施加电位下,过程(2)相对不重要,但在0.3 V以上,当费米能量越过阿拉斯的x波段时,过程(2)就变得占主导地位。
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