{"title":"The challenges and impact of parasitic extraction at 65 nm","authors":"K. Chow","doi":"10.1109/ISQED.2006.133","DOIUrl":null,"url":null,"abstract":"Although industry-wide adoption of 65nm technology is in its infancy, major foundries have started developing design kits for the 65nm base. For designers, this means managing new and complex process variability and interconnect issues, relevant to specific design flows, using advanced parasitic extraction methodologies","PeriodicalId":138839,"journal":{"name":"7th International Symposium on Quality Electronic Design (ISQED'06)","volume":"49 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-03-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"7th International Symposium on Quality Electronic Design (ISQED'06)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISQED.2006.133","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
Although industry-wide adoption of 65nm technology is in its infancy, major foundries have started developing design kits for the 65nm base. For designers, this means managing new and complex process variability and interconnect issues, relevant to specific design flows, using advanced parasitic extraction methodologies
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