Uniformity of Fe-diffused semi-insulating InP wafers

R. Fornari, T. Gorog, J. Jiménez, E. de la Puente, I. Grant, M. Brozel, M. Nicholls
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Abstract

A study on the uniformity of Fe-diffused semi-insulating InP wafers is presented. The electrical characterisation showed that after the diffusion annealing the wafers became semi-insulating, with resistivities generally above 10/sup 8/ /spl Omega/ cm and mobilities in the range 3000-4000 cm/sup 2//Vs. PL and resistivity mapping showed that the short range uniformity is excellent but that sometimes the wafers exhibit long range gradients of resistivity and luminescence intensity. The gradients are believed to be associated with temperature gradients inside the annealing furnace.
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fe扩散半绝缘InP晶圆的均匀性
对fe扩散半绝缘InP片的均匀性进行了研究。电学表征表明,经扩散退火后晶圆呈半绝缘状态,电阻率一般在10/sup 8/ /spl ω / cm以上,迁移率在3000 ~ 4000 cm/sup 2//Vs之间。PL和电阻率图显示,晶圆的近程均匀性很好,但有时会出现电阻率和发光强度的长程梯度。这些梯度被认为与退火炉内部的温度梯度有关。
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