Electrical properties of MPS/PANI heterojunction doped with erbium

Rosimara P. Toledo, D. R. Huanca, A. Oliveira, R. Rubinger, Matheus J. Silva, S. G. S. Filho
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Abstract

Macroporous silicon films were yielded by electrochemical corrosion in HF:DMF solution, after the structure passivation with polyaniline and then this film was doped with erbium using the cyclic voltammetry method. The structural analysis by scanning electron microscopy shown us the pores formation, whereas the analysis by Fourier transform infrared spectroscopy reveals the formation of silicon oxide during the PANI deposition and the structural modification of PANI by the formation of addition functional groups by the erbium atoms. The results of the electrical measurements indicated that PANI reduces the space charge region width, as well as the amount of surface state density, but the current flow through the MPS/PANI devices is low due to the presence of SiO2 inside the structure. This effect is partially recovered by the inclusion of erbium because of its effect of further reducing the space charge region width.
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掺铒MPS/PANI异质结的电学性能
在HF:DMF溶液中电化学腐蚀制备了大孔硅膜,经聚苯胺钝化后,再用循环伏安法掺杂铒。扫描电镜结构分析显示了PANI沉积过程中气孔的形成,傅里叶变换红外光谱分析显示了氧化硅的形成以及铒原子形成加成官能团对PANI结构的修饰。电学测量结果表明,聚苯胺降低了MPS/PANI器件的空间电荷区宽度和表面态密度,但由于结构内部SiO2的存在,通过MPS/PANI器件的电流较低。由于铒的加入进一步减小了空间电荷区宽度,这种效应可以部分恢复。
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