Low-temperature Grown Ge1−xSnx layers on a metallic silicide

M. Kawano, S. Yamada, M. Miyao, K. Hamaya
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Abstract

We have demonstrated epitaxial growth of Ge1-xSnx layers on Fe3Si by low-temperature MBE. We believe that this technique can be applicable to the growth of Ge1-xSnx on various ferromagnetic metallic templates toward high-performance spin-based MOSFETs.
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金属硅化物上低温生长的Ge1−xSnx层
我们用低温MBE证明了Ge1-xSnx层在Fe3Si上的外延生长。我们相信该技术可以应用于在各种铁磁金属模板上生长Ge1-xSnx,以获得高性能的自旋基mosfet。
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