3D IC architecture for high density memories

Sang-Yun Lee, D. Schroder
{"title":"3D IC architecture for high density memories","authors":"Sang-Yun Lee, D. Schroder","doi":"10.1109/IMW.2010.5488391","DOIUrl":null,"url":null,"abstract":"3D ICs for high-density memories have significant benefits compared to conventional memories. The first one is high productivity. An area for memory arrays is not required on the semiconductor substrate and the area for the memory control logic can be further reduced for an optimized logic process. Hence, about 4 times more die-per-wafer can be expected for DRAMs with a cell efficiency of about 50%, leading to reduced fab tool investment with increased productivity. Furthermore, the process is optimized for both logic and memory cells because they are processed sequentially. It is well known that processes for logic and memory, especially DRAM and flash, are not compatible. Using 3D ICs, process incompatibility problems are easily solved and SoC (System-on-a-Chip) can be implemented with various embedded memories. An additional advantage is the small form factor. As die sizes shrink for 3D ICs, the yield will increase rapidly, especially important for FPGAs with distributed memories and high-performance CPUs with large cache memories. 3D ICs for high-density memories will extend the lifespan of low-cost CMOS memories.","PeriodicalId":149628,"journal":{"name":"2010 IEEE International Memory Workshop","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"15","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 IEEE International Memory Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMW.2010.5488391","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 15

Abstract

3D ICs for high-density memories have significant benefits compared to conventional memories. The first one is high productivity. An area for memory arrays is not required on the semiconductor substrate and the area for the memory control logic can be further reduced for an optimized logic process. Hence, about 4 times more die-per-wafer can be expected for DRAMs with a cell efficiency of about 50%, leading to reduced fab tool investment with increased productivity. Furthermore, the process is optimized for both logic and memory cells because they are processed sequentially. It is well known that processes for logic and memory, especially DRAM and flash, are not compatible. Using 3D ICs, process incompatibility problems are easily solved and SoC (System-on-a-Chip) can be implemented with various embedded memories. An additional advantage is the small form factor. As die sizes shrink for 3D ICs, the yield will increase rapidly, especially important for FPGAs with distributed memories and high-performance CPUs with large cache memories. 3D ICs for high-density memories will extend the lifespan of low-cost CMOS memories.
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用于高密度存储器的3D集成电路架构
与传统存储器相比,用于高密度存储器的3D集成电路具有显著的优势。第一个是高生产率。在半导体衬底上不需要用于存储阵列的区域,并且用于存储控制逻辑的区域可以进一步减小以用于优化的逻辑过程。因此,在电池效率约为50%的情况下,每片dram的晶片芯片数量可增加约4倍,从而减少晶圆厂工具投资,提高生产率。此外,该过程对逻辑和存储单元都进行了优化,因为它们是顺序处理的。众所周知,逻辑进程和存储器,特别是DRAM和闪存,是不兼容的。使用3D ic,可以轻松解决工艺不兼容问题,并且可以使用各种嵌入式存储器实现SoC(片上系统)。另一个优点是外形小。随着3D集成电路的芯片尺寸缩小,产量将迅速增加,这对于具有分布式存储器的fpga和具有大缓存存储器的高性能cpu尤其重要。用于高密度存储器的3D集成电路将延长低成本CMOS存储器的使用寿命。
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