Modeling of Charge Failure Mechanisms during the Short Term Retention Depending on Program/Erase Cycle Counts in 3-D NAND Flash Memories

Changbeom Woo, Shinkeun Kim, Jaeyeol Park, Hyungcheol Shin, Haesoo Kim, Gil-Bok Choi, M. Seo, K. Noh
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引用次数: 14

Abstract

For the first time, we analyzed the effect of program/erase (P/E) cycles on short term retention in 3-D NAND flash memory. Trap-assisted tunneling (TAT) component with relatively large time-constant (τ) was found after P/E cycle stress. We have confirmed that the charge failure mechanisms consist of four components. Short term retention data measured at various temperatures and at several program verify levels (PV) for two patterns were analyzed and separated using our stretched exponential model. Finally, the activation energy (Ea) of each charge failure mechanism was extracted by the Arrhenius law and the magnitudes of Ea were compared as a function of P/E cycle counts.
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三维NAND闪存中基于程序/擦除周期计数的短期保留电荷失效机制建模
我们首次分析了程序/擦除(P/E)周期对3-D NAND闪存短期保留的影响。在P/E循环应力作用下,发现陷阱辅助隧道(TAT)组分具有较大的时间常数(τ)。我们已经确认了电荷失效机制由四个部分组成。使用我们的扩展指数模型对两种模式在不同温度和不同程序验证水平(PV)下测量的短期保留数据进行了分析和分离。最后,利用Arrhenius定律提取了各电荷失效机制的活化能(Ea),并比较了Ea的大小与P/E循环次数的关系。
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