Electroluminescence measurement of InAlAs/InGaAs HEMTs lattice-matched to InP substrates

N. Shigekawa, Takatomo Enoki, Tomofumi Furuta, Hiroshi Ito
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引用次数: 6

Abstract

InAlAs/InGaAs HEMTs latticed-matched to InP substrates are promising devices for high-speed application owing to their excellent high-frequency performances. Their low breakdown voltage and the appearance of a kink, however, limit their application to practical circuits. The impact ionization at the drain edge in the channel has been pointed out as the origin of these phenomena. Several authors have used electroluminescence (EL) from FETs composed of compound semiconductors to investigate the impact ionization in their channels. For InGaAs-based FETs, EL with energy far higher than the band gap of the channel has been already investigated. In this paper, we report measurements of the EL appearing from the top of the InAlAs/InGaAs HEMTs for energy lower than 1 eV at room temperature. We mainly discuss the carrier temperature extracted from the spectrum and the spatial distribution of the intensity. We also report the EL appearing from the cleaved side of the FET channel.
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与InP衬底晶格匹配的InAlAs/InGaAs HEMTs的电致发光测量
与InP衬底相匹配的InAlAs/InGaAs hemt由于其优异的高频性能而成为高速应用的有前途的器件。然而,它们的低击穿电压和扭结的出现限制了它们在实际电路中的应用。指出这些现象的根源是通道中漏边的碰撞电离。一些作者已经利用由化合物半导体组成的场效应管的电致发光(EL)来研究其通道中的冲击电离。对于基于ingaas的fet,已经研究了能量远高于通道带隙的EL。在本文中,我们报告了在室温下能量低于1 eV的InAlAs/InGaAs hemt顶部出现的EL的测量结果。我们主要讨论了从光谱中提取的载流子温度和强度的空间分布。我们还报道了从FET通道的劈裂侧出现的EL。
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