Dielectric breakdown and electroforming phenomenon in the cadmium arsenide thin films devices

M. Din, R. D. Gould
{"title":"Dielectric breakdown and electroforming phenomenon in the cadmium arsenide thin films devices","authors":"M. Din, R. D. Gould","doi":"10.1109/SMELEC.1998.781175","DOIUrl":null,"url":null,"abstract":"In this high conductivity semiconductor material, it is not possible to distinguish between the onset of these two processes, and it is highly probable that the two processes are initiated simultaneously. Electroforming is normally observed in insulating materials (Ray and Hogarth 1984), where there is a very rapid increase in the current drawn at a particular moment. In the test device, a decrease in current was observed at the field F/sub b/, which may be identified with dielectric breakdown; however, after this event the samples showed the typical electroforming characteristic of voltage-controlled differential negative resistance (VCNR) for both increasing and decreasing voltages. The basic characteristics observed for both these phenomena are discussed in the paper.","PeriodicalId":356206,"journal":{"name":"ICSE'98. 1998 IEEE International Conference on Semiconductor Electronics. Proceedings (Cat. No.98EX187)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ICSE'98. 1998 IEEE International Conference on Semiconductor Electronics. Proceedings (Cat. No.98EX187)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMELEC.1998.781175","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

In this high conductivity semiconductor material, it is not possible to distinguish between the onset of these two processes, and it is highly probable that the two processes are initiated simultaneously. Electroforming is normally observed in insulating materials (Ray and Hogarth 1984), where there is a very rapid increase in the current drawn at a particular moment. In the test device, a decrease in current was observed at the field F/sub b/, which may be identified with dielectric breakdown; however, after this event the samples showed the typical electroforming characteristic of voltage-controlled differential negative resistance (VCNR) for both increasing and decreasing voltages. The basic characteristics observed for both these phenomena are discussed in the paper.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
砷化镉薄膜器件中的介电击穿和电铸现象
在这种高导电性半导体材料中,不可能区分这两种过程的开始,而且很可能这两种过程是同时开始的。电铸通常在绝缘材料中观察到(Ray和Hogarth 1984),其中在特定时刻产生的电流非常迅速地增加。在试验装置中,在场F/sub b/处观察到电流减小,这可能是介质击穿;然而,在此事件之后,样品在增加和降低电压时都表现出典型的电压控制差分负电阻(VCNR)电铸特性。本文讨论了这两种现象的基本特征。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
New design of variable X-coupler optical waveguide passive device Fabrication of photodiode by screen printing technique Saturation parameters of erbium doped fibre amplifiers Current sensor and test processor design for integration of logic and IDDQ testing of CMOS ICs A non-linear description of the bias dependent parasitic resistances of quarter micron MOSFETs
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1